| Nanoindentation of shape memory polymer networks E Wornyo, K Gall, F Yang, W King Polymer 48 (11), 3213-3225, 2007 | 120 | 2007 |
| Uses of mobile phones in post-conflict Liberia ML Best, E Wornyo, TN Smyth, J Etherton 2009 International Conference on Information and Communication Technologies …, 2009 | 56 | 2009 |
| Nanoscale indent formation in shape memory polymers using a heated probe tip F Yang, E Wornyo, K Gall, WP King Nanotechnology 18 (28), 285302, 2007 | 33 | 2007 |
| Post-conflict communications: The case of Liberia ML Best, K Jones, I Kondo, D Thakur, E Wornyo, C Yu Communications of the ACM 50 (10), 33-39, 2007 | 29 | 2007 |
| Thermomechanical formation and recovery of nanoindents in a shape memory polymer studied using a heated tip F Yang, E Wornyo, K Gall, WP King Scanning: The Journal of Scanning Microscopies 30 (2), 197-202, 2008 | 21 | 2008 |
| Nanoscale strain storage in a shape memory polymer using a heated probe tip F Yang, E Wornyo, K Gall, WP King Nanotechnology 18, 285302, 2007 | 16 | 2007 |
| Modular fuses and antifuses for integrated circuits JH Zhang, LA Clevenger, C Radens, XU Yiheng, E Wornyo US Patent 9,240,375, 2016 | 11 | 2016 |
| Through silicon via structure for internal chip cooling JH Zhang, LA Clevenger, C Radens, XU Yiheng, E Wornyo US Patent 8,829,670, 2014 | 9 | 2014 |
| Modeling and optimization of the deposition of shape memory polymers for information storage applications E Wornyo, GS May, K Gall IEEE transactions on semiconductor manufacturing 22 (3), 409-416, 2009 | 9 | 2009 |
| Competitive and cost effective copper/low-k interconnect (BEOL) for 28 nm CMOS technologies R Augur, C Child, JH Ahn, TJ Tang, L Clevenger, D Kioussis, H Masuda, ... Microelectronic engineering 92, 42-44, 2012 | 5 | 2012 |
| Shape memory capacitors for next generation embedded actives R Doraiswami, E Wornyo, S Bhattacharya, KA Gall 56th Electronic Components and Technology Conference 2006, 3 pp., 2006 | 5 | 2006 |
| Modular fuses and antifuses for integrated circuits JH Zhang, XU Yiheng, LA Clevenger, C Radens, E Wornyo US Patent 9,905,511, 2018 | 2 | 2018 |
| Technique for fabrication of microelectronic capacitors and resistors JH Zhang, LA Clevenger, C Radens, XU Yiheng, E Wornyo US Patent 9,385,177, 2016 | 2 | 2016 |
| Method for controlling the profile of an etched metallic layer LA Clevenger, CJ Radens, RS Wise, E Wornyo, XU Yiheng, J Zhang US Patent 9,209,036, 2015 | 2 | 2015 |
| Technique for fabrication of microelectronic capacitors and resistors JH Zhang, LA Clevenger, C Radens, XU Yiheng, E Wornyo US Patent 9,633,986, 2017 | 1 | 2017 |
| Method for controlling the profile of an etched metallic layer LA Clevenger, CJ Radens, RS Wise, E Wornyo, XU Yiheng, J Zhang US Patent 9,324,793, 2016 | 1 | 2016 |
| Thickness and uniformity modeling of the deposition of shape memory polymers for information storage applications E Wornyo, K Gall, GS May 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 85-89, 2008 | 1 | 2008 |
| Fabrication and characterization of shape memory polymers at small-scales E Wornyo Georgia Institute of Technology, 2008 | 1 | 2008 |
| Structure and method for interconnect spatial frequency doubling using selective ridges JH Zhang, LA Clevenger, C Radens, XU Yiheng, E Wornyo US Patent 8,889,506, 2014 | | 2014 |
| Process Technology, Characterization, and Optimization-Modeling and Optimization of the Deposition of Shape Memory Polymers for Information Storage Applications E Wornyo, GS May, K Gall IEEE Transactions on Semiconductor Manufacturing 22 (3), 409, 2009 | | 2009 |
Ken GallProfessor of Mechanical Engineering and Materials Science, DukeVerified email at duke.edu
