| Phenomenology of electron-beam-induced photoresist shrinkage trends B Bunday, A Cordes, J Allgair, V Tileli, Y Avitan, R Peltinov, M Bar-zvi, ... Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 37 | 2009 |
| Carbon nanotube AFM probes for microlithography process control HC Liu, D Fong, GA Dahlen, M Osborn, S Hand, JR Osborne Metrology, Inspection, and Process Control for Microlithography XX 6152 …, 2006 | 24 | 2006 |
| Advanced measurement and diagnosis of the effect on the underlayer roughness for industrial standard metrology JH Kim, S Moon, JW Kim, D Lee, BC Park, DH Kim, Y Jeong, S Hand, ... Scientific Reports 9 (1), 1018, 2019 | 17 | 2019 |
| High-speed atomic force microscopy for patterned defect review J Osborne, S Hu, H Wang, Y Hu, J Shi, S Hand, C Su Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 9 | 2013 |
| Resist shrink characterization methodology for more accurate CD metrology MA Breton, K Petrillo, J Church, L Meli, J Fullam, S Sieg, R Lallement, ... Metrology, Inspection, and Process Control XXXVI, PC120530C, 2022 | 6 | 2022 |
| Line top loss and line top roughness characterizations of EUV resists D Schmidt, K Petrillo, M Breton, J Fullam, S Hand, J Osborne, W Wang, ... Metrology, Inspection, and Process Control for Microlithography XXXIV 11325 …, 2020 | 6 | 2020 |
| CDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires S Levi, I Schwarzband, Y Weinberg, R Cornell, O Adan, GM Cohen, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 6 | 2014 |
| Improvement in metrology on new 3D-AFM platform I Schmitz, M Osborn, S Hand, Q Chen Photomask Technology 2008 7122, 963-973, 2008 | 6 | 2008 |
| Device level 3D characterization using PeakForce AFM P Timoney, X Zhang, A Vaid, S Hand, J Osborne, E Milligan, A Feinstein Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 5 | 2016 |
| Precise probe placement in automated scanning probe microscopy systems J Osborne, E Milligan, A Lopez, X Wu, S Hand, V Fonoberov US Patent 9,995,763, 2018 | 4 | 2018 |
| Towards development of a sidewall roughness standard A Cordes, B Bunday, S Hand, J Osborne, H Porter Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 4 | 2013 |
| Self-assembly of lamellar structures of fatty acids complexed with surfactant in aqueous solutions S Hand, J Yang Langmuir 14 (13), 3597-3601, 1998 | 4 | 1998 |
| AFM characterization for Gate-All-Around (GAA) devices M Breton, J Fullam, D Kong, D Schmidt, A Greene, J Frougier, S Hand, ... Metrology, Inspection, and Process Control for Microlithography XXXIV 11325 …, 2020 | 2 | 2020 |
| 3D optical proximity model optimization using inline 3DSEM metrology S Levi, I Schwarzband, A Karvtsov, M Tobayas, HJ Stock, T Muelders, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 2 | 2019 |
| Analysis of InGaAs Epi defects by conductive AFM A Cordes, T Dyer, S Hand ISTFA 2014, 189-195, 2014 | 2 | 2014 |
| Automated AFM as an Industrial Process Metrology Tool for Nanoelectronic Manufacturing T Bao, D Fong, S Hand Applied Scanning Probe Methods X: Biomimetics and Industrial Applications …, 2008 | 2 | 2008 |
| High speed atomic force profilometry of large areas J Osborne, V Fonoberov, SM Hand US Patent 11,668,730, 2023 | 1 | 2023 |
| High speed atomic force profilometry of large areas J Osborne, V Fonoberov, SM Hand US Patent 10,969,406, 2021 | 1 | 2021 |
| Method of Analyzing Metrology Data V Fonoberov, S Hand, D Fey US Patent App. 18/209,040, 2023 | | 2023 |
| AFM imaging with metrology-preserving real time denoising V Fonoberov, J Young, J Osborne, S Hand US Patent 11,796,565, 2023 | | 2023 |
