| A novel dry selective etch of SiGe for the enablement of high performance logic stacked gate-all-around nanosheet devices N Loubet, S Kal, C Alix, S Pancharatnam, H Zhou, C Durfee, M Belyansky, ... 2019 IEEE International Electron Devices Meeting (IEDM), 11.4. 1-11.4. 4, 2019 | 68 | 2019 |
| EUV patterning successes and frontiers N Felix, D Corliss, K Petrillo, N Saulnier, Y Xu, L Meli, H Tang, A De Silva, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 480-486, 2016 | 39 | 2016 |
| A direct fusion drive for rocket propulsion YS Razin, G Pajer, M Breton, E Ham, J Mueller, M Paluszek, AH Glasser, ... Acta Astronautica 105 (1), 145-155, 2014 | 37 | 2014 |
| Review of nanosheet metrology opportunities for technology readiness MA Breton, D Schmidt, A Greene, J Frougier, N Felix Journal of Micro/Nanopatterning, Materials, and Metrology 21 (2), 021206-021206, 2022 | 17 | 2022 |
| Electrical test prediction using hybrid metrology and machine learning M Breton, R Chao, GR Muthinti, AA de la Peña, J Simon, AJ Cepler, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 17 | 2017 |
| Advanced in-line metrology strategy for self-aligned quadruple patterning R Chao, M Breton, B L'herron, B Mendoza, R Muthinti, F Nelson, ... SPIE Proceedings 9778 (13), 2016 | 14 | 2016 |
| Machine learning and hybrid metrology using scatterometry and LE-XRF to detect voids in copper lines D Kong, K Motoyama, H Huang, B Mendoza, M Breton, GR Muthinti, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 12 | 2019 |
| Measuring local CD uniformity in EUV vias with scatterometry and machine learning D Kong, D Schmidt, J Church, CC Liu, M Breton, C Murray, E Miller, L Meli, ... Metrology, Inspection, and Process Control for Microlithography XXXIV 11325 …, 2020 | 11 | 2020 |
| Modular aneutronic fusion engine G Pajer, Y Razin, M Paluszek, AH Glasser, S Cohen Space Propulsion, 2012 | 10 | 2012 |
| Development of SiGe indentation process control for gate-all-around FET technology enablement D Schmidt, A Cepler, C Durfee, S Pancharatnam, J Frougier, M Breton, ... IEEE Transactions on Semiconductor Manufacturing 35 (3), 412-417, 2022 | 9 | 2022 |
| In-line characterization of non-selective SiGe nodule defects with scatterometry enabled by machine learning D Kong, R Chao, M Breton, C Liu, GR Muthinti, S Seo, NJ Loubet, ... Metrology, Inspection, and Process Control for Microlithography XXXII 10585 …, 2018 | 9 | 2018 |
| Structural and electrical demonstration of SiGe cladded channel for PMOS stacked nanosheet gate-all-around devices S Mochizuki, B Colombeau, J Zhang, SC Kung, M Stolfi, H Zhou, M Breton, ... 2020 IEEE Symposium on VLSI Technology, 1-2, 2020 | 8 | 2020 |
| Resist shrink characterization methodology for more accurate CD metrology MA Breton, K Petrillo, J Church, L Meli, J Fullam, S Sieg, R Lallement, ... Metrology, Inspection, and Process Control XXXVI, PC120530C, 2022 | 6 | 2022 |
| Advanced EUV resist characterization using scatterometry and machine learning D Schmidt, K Petrillo, M Breton, J Fullam, R Koret, I Turovets, A Cepler 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2021 | 6 | 2021 |
| Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch J Church, L Meli, J Guo, M Burkhardt, C Mack, A DeSilva, K Petrillo, ... Extreme Ultraviolet (EUV) Lithography XI 11323, 165-173, 2020 | 6 | 2020 |
| Line top loss and line top roughness characterizations of EUV resists D Schmidt, K Petrillo, M Breton, J Fullam, S Hand, J Osborne, W Wang, ... Metrology, Inspection, and Process Control for Microlithography XXXIV 11325 …, 2020 | 6 | 2020 |
| Highly selective SiGe dry etch process for the enablement of stacked nanosheet gate-all-around transistors C Durfee, S Kal, S Pancharatnam, M Bhuiyan, I Otto IV, M Flaugh, J Smith, ... ECS Transactions 104 (4), 217, 2021 | 5 | 2021 |
| Study of TiN and TaN underlayer properties and their influence on W growth S Pancharatnam, G Karve, J Wynne, B Mendoza, S DeVries, RN Pujari, ... IEEE Transactions on Semiconductor Manufacturing 32 (4), 374-380, 2019 | 5 | 2019 |
| Performance of stacked nanosheet gate all around FET’s with EUV patterned gate and sheets I Seshadri, J Church, P Hundekar, M Breton, J Zhang, E Miller, A Greene, ... Extreme Ultraviolet (EUV) Lithography XII 11609, 116090S, 2021 | 4 | 2021 |
| Development of SiGe indentation process control to enable stacked Nanosheet FET technology D Kong, D Schmidt, M Breton, J Frougier, A Greene, J Zhang, V Basker, ... 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2020 | 4 | 2020 |
Daniel SchmidtIBM ResearchVerified email at ibm.com
