| Mold deformation in nanoimprint lithography F Lazzarino, C Gourgon, P Schiavone, C Perret Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 97 | 2004 |
| Influence of pattern density in nanoimprint lithography C Gourgon, C Perret, G Micouin, F Lazzarino, JH Tortai, O Joubert, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003 | 86 | 2003 |
| Characterization of 8-in. wafers printed by nanoimprint lithography C Perret, C Gourgon, F Lazzarino, J Tallal, S Landis, R Pelzer Microelectronic Engineering 73, 172-177, 2004 | 73 | 2004 |
| Uniformity across 200 mm silicon wafers printed by nanoimprint lithography C Gourgon, C Perret, J Tallal, F Lazzarino, S Landis, O Joubert, R Pelzer Journal of Physics D: Applied Physics 38 (1), 70, 2004 | 58 | 2004 |
| Direct metal etch of ruthenium for advanced interconnect S Paolillo, D Wan, F Lazzarino, N Rassoul, D Piumi, Z Tőkei Journal of Vacuum Science & Technology B 36 (3), 2018 | 55 | 2018 |
| Ultimate contact hole resolution using immersion lithography with line/space imaging V Truffert, J Bekaert, F Lazzarino, M Maenhoudt, A Miller, M Moelants, ... Optical Microlithography XXII 7274, 203-214, 2009 | 49 | 2009 |
| Printing the metal and contact layers for the 32-and 22-nm node: comparing positive and negative tone development process L Van Look, J Bekaert, V Truffert, V Wiaux, F Lazzarino, M Maenhoudt, ... Optical Microlithography XXIII 7640, 410-421, 2010 | 47 | 2010 |
| Comparing positive and negative tone development process for printing the metal and contact layers of the 32-and 22-nm nodes J Bekaert, L Van Look, V Truffert, F Lazzarino, G Vandenberghe, ... Journal of Micro/Nanolithography, MEMS and MOEMS 9 (4), 043007-043007-10, 2010 | 43 | 2010 |
| Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells J Bekaert, B Laenens, S Verhaegen, L Van Look, D Trivkovic, F Lazzarino, ... Optical Microlithography XXIII 7640, 79-90, 2010 | 41 | 2010 |
| SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform J Bekaert, P Di Lorenzo, M Mao, S Decoster, S Larivière, JH Franke, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 73-87, 2017 | 34 | 2017 |
| Demonstration of scaled 0.099µm2 FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology A Veloso, S Demuynck, M Ercken, AM Goethals, S Locorotondo, ... 2009 IEEE International Electron Devices Meeting (IEDM), 1-4, 2009 | 34 | 2009 |
| Buried power rail integration with FinFETs for ultimate CMOS scaling A Gupta, OV Pedreira, G Arutchelvan, H Zahedmanesh, K Devriendt, ... IEEE Transactions on Electron Devices 67 (12), 5349-5354, 2020 | 32 | 2020 |
| Subtractive etch of ruthenium for sub-5nm interconnect D Wan, S Paolillo, N Rassoul, BK Kotowska, V Blanco, C Adelmann, ... 2018 IEEE International Interconnect Technology Conference (IITC), 10-12, 2018 | 28 | 2018 |
| Demonstration of an N7 integrated fab process for metal oxide EUV photoresist D De Simone, M Mao, M Kocsis, P De Schepper, F Lazzarino, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 93-101, 2016 | 22 | 2016 |
| Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform VMB Carballo, J Bekaert, M Mao, BK Kotowska, S Larivière, I Ciofi, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 241-250, 2017 | 21 | 2017 |
| Experimental verification of source-mask optimization and freeform illumination for 22-nm node static random access memory cells J Bekaert, B Laenens, S Verhaegen, L Van Look, D Trivkovic, F Lazzarino, ... Journal of Micro/Nanolithography, MEMS and MOEMS 10 (1), 013008-013008-10, 2011 | 20 | 2011 |
| Inflection points in interconnect research and trends for 2nm and beyond in order to solve the RC bottleneck Z Tőkei, V Vega, G Murdoch, M O’Toole, K Croes, R Baert, ... 2020 IEEE International Electron Devices Meeting (IEDM), 32.2. 1-32.2. 4, 2020 | 19 | 2020 |
| Replication of sub-40 nm gap nanoelectrodes over an 8-in. substrate by nanoimprint lithography J Tallal, D Peyrade, F Lazzarino, K Berton, C Perret, M Gordon, ... Microelectronic engineering 78, 676-681, 2005 | 18 | 2005 |
| Influence of residual solvent in polymers patterned by nanoimprint lithography C Gourgon, JH Tortai, F Lazzarino, C Perret, G Micouin, O Joubert, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 18 | 2004 |
| Patterning challenges for direct metal etch of ruthenium and molybdenum at 32 nm metal pitch and below S Decoster, E Camerotto, G Murdoch, S Kundu, QT Le, Z Tőkei, G Jurczak, ... Journal of Vacuum Science & Technology B 40 (3), 2022 | 16 | 2022 |
