| Optical properties of large-area polycrystalline chemical vapor deposited graphene by spectroscopic ellipsometry FJ Nelson, VK Kamineni, GR Muthinti, T Zhang, ES Comfort, JU Lee, ., ... Applied Physics Letters 97 (25), 253110, 2010 | 231 | 2010 |
| Complete band offset characterization of the HfO 2/SiO 2/Si stack using charge corrected X-ray photoelectron spectroscopy E Bersch, GR Muthinti, M Di, S Consiglio, RD Clark, GJ Leusink, ... Journal of Applied Physics 107 (4), 043702-043702-13, 2010 | 129 | 2010 |
| Comparison of methods to determine bandgaps of ultrathin HfO2 films using spectroscopic ellipsometry M Di, E Bersch, G Muthinti, S Consiglio, AC Clark, Diebold, R D, ... Journal of Vacuum Science & Technology A 29 (4), 041001, 2011 | 54 | 2011 |
| 3D-interconnect: Visualization of extrusion and voids induced in copper-filled through-silicon vias (TSVs) at various temperatures using X-ray microscopy LW Kong, AC Rudack, P Krueger, E Zschech, S Arkalgud, G Muthinti, ... Microelectronic Engineering 92, 24-28, 2012 | 40 | 2012 |
| Texturing and Tetragonal Phase Stabilization of ALD HfxZr1-xO2 Using a Cyclical Deposition and Annealing Scheme K Tapily, S Consiglio, RD Clark, GR Muthinti, R Vasić, E Bersch, ... ECS Transactions 45 (3), 411-420, 2012 | 38 | 2012 |
| Multi-technique x-ray and optical characterization of crystalline phase, texture, and electronic structure of atomic layer deposited Hf1− xZrxO2 gate dielectrics deposited by a … R Vasić, GR Muthinti, S Consiglio, RD Clark, K Tapily, S Sallis, B Chen, ... Journal of Applied Physics 113 (23), 234101, 2013 | 26 | 2013 |
| Effects of stress on the dielectric function of strained pseudomorphic Si1− xGex alloys from 0 to 75% Ge grown on Si (001) G Raja Muthinti, M Medikonda, T Adam, A Reznicek, AC Diebold Journal of Applied Physics 112 (5), 2012 | 26 | 2012 |
| Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology D Dixit, GR Muthinti, S O’Mullane, S Sunkoju, A Gottipati, ER Hosler, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (3), 031208-031208, 2015 | 22 | 2015 |
| Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry DJ Dixit, GR Muthinti, V Kamineni, R Farrell, ER Hosler, M Preil, J Race, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (2), 021102-021102, 2015 | 20 | 2015 |
| Optical properties of pseudomorphic Ge1− xSnx (x= 0 to 0.11) alloys on Ge (001) M Medikonda, GR Muthinti, R Vasić, TN Adam, A Reznicek, ... Journal of Vacuum Science & Technology B 32 (6), 2014 | 20 | 2014 |
| Electrical test prediction using hybrid metrology and machine learning M Breton, R Chao, GR Muthinti, AA de la Peña, J Simon, AJ Cepler, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 17 | 2017 |
| Advances in CD‐metrology (CD‐SAXS, Mueller matrix based scatterometry, and SEM) BL Thiel, AJ Cepler, AC Diebold, RJ Matyi AIP Conference Proceedings 1395 (1), 298-304, 2011 | 17 | 2011 |
| Mueller based scatterometry measurement of nanoscale structures with anisotropic in-plane optical properties GR Muthinti, M Medikonda, J Fronheiser, VK Kamineni, B Peterson, ... Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 16 | 2013 |
| Multitechnique metrology methods for evaluating pitch walking in 14 nm and beyond FinFETs GR Muthinti, R Chao, KK Kohli, Y Zhang, A Madan, AJ Hong, D Conklin, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (4), 041411-041411, 2014 | 14 | 2014 |
| Measurement of periodicity and strain in arrays of single crystal silicon and pseudomorphic Si1− xGex/Si fin structures using x-ray reciprocal space maps M Medikonda, GR Muthinti, J Fronheiser, V Kamineni, M Wormington, ... Journal of Vacuum Science & Technology B 32 (2), 2014 | 14 | 2014 |
| Crystallinity of Electrically Scaled Atomic Layer Deposited HfO2 from a Cyclical Deposition and Annealing Scheme S Consiglio, RD Clark, E Bersch, JD LaRose, I Wells, K Tapily, GJ Leusink, ... Journal of The Electrochemical Society 159 (6), G80, 2012 | 13 | 2012 |
| Machine learning and hybrid metrology using scatterometry and LE-XRF to detect voids in copper lines D Kong, K Motoyama, H Huang, B Mendoza, M Breton, GR Muthinti, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 12 | 2019 |
| Characterization of e-beam patterned grating structures using Mueller matrix based scatterometry GR Muthinti, B Peterson, RK Bonam, AC Diebold Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (1), 013018-013018, 2013 | 12 | 2013 |
| Mueller matrix optical scatterometry of Si fins patterned using directed self-assembly block copolymer line arrays D Dixit, GR Muthinti, M Medikonda, AC Diebold, B Peterson, J Race Advanced Semiconductor Manufacturing Conference (ASMC), 2014 25th Annual …, 2014 | 11 | 2014 |
| Nanoscale characterization and metrology AC Diebold, GR Muthinti Journal of Vacuum Science & Technology A 31 (5), 050804, 2013 | 10 | 2013 |
