| A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films SJ Kim, J Mohan, HS Kim, SM Hwang, N Kim, YC Jung, A Sahota, K Kim, ... Materials 13 (13), 2968, 2020 | 37 | 2020 |
| Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings SM Hwang, HS Kim, DN Le, AV Ravichandran, A Sahota, J Lee, YC Jung, ... ACS Applied Nano Materials 4 (3), 2558-2564, 2021 | 11 | 2021 |
| High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor HS Kim, SM Hwang, X Meng, YC Byun, YC Jung, AV Ravichandran, ... Journal of Materials Chemistry C 8 (37), 13033-13039, 2020 | 10 | 2020 |
| Extremely Low Leakage Threshold Switch with Enhanced Characteristics via Ag Doping on Polycrystalline ZnO Fabricated by Facile Electrochemical Deposition for … HS Kim, A Sahota, J Mohan, AT Lucero, Y Chan Jung, M Kim, JS Lee, ... ACS Applied Electronic Materials 3 (5), 2309-2316, 2021 | 9 | 2021 |
| Robust low-temperature (350° C) ferroelectric Hf0. 5Zr0. 5O2 fabricated using anhydrous H2O2 as the ALD oxidant YC Jung, JH Kim, H Hernandez-Arriaga, J Mohan, SM Hwang, DN Le, ... Applied Physics Letters 121 (22), 2022 | 5 | 2022 |
| Relaxation Induced by Imprint Phenomena in Low-Temperature (400 °C) Processed Hf0.5Zr0.5O2-Based Metal-Ferroelectric-Metal Capacitors J Mohan, YC Jung, H Hernandez-Arriaga, JH Kim, T Onaya, A Sahota, ... ACS Applied Electronic Materials 4 (4), 1405-1414, 2022 | 4 | 2022 |
| A Novel Combinatorial Approach to the Ferroelectric Properties in HfxZr1−xO2 Deposited by Atomic Layer Deposition YC Jung, J Mohan, SM Hwang, JH Kim, DN Le, A Sahota, N Kim, ... physica status solidi (RRL)–Rapid Research Letters 15 (5), 2100053, 2021 | 3 | 2021 |
| Highly reliable selection behavior with controlled Ag doping of nano-polycrystalline ZnO Layer for 3D X-Point framework A Sahota, HS Kim, J Mohan, YC Jung, H Hernandez-Arriaga, DN Le, ... IEEE Electron Device Letters 43 (1), 21-24, 2021 | 1 | 2021 |
| High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1, 1, 1-tris (dimethylamino) disilane SM Hwang, HS Kim, DN Le, A Sahota, J Lee, YC Jung, SW Kim, SJ Kim, ... Journal of Vacuum Science & Technology A 40 (2), 2022 | | 2022 |
| A Steep-Slope Threshold Switching Selector Using Silver-Doped Polycrystalline Zinc Oxide: Fabrication, Characterization, & Application for 3D X-Point Memory & Neuromorphic Devices A Sahota | | 2021 |
| Nano-polycrystalline Ag-doped ZnO layer for steep-slope threshold switching selectors A Sahota, HS Kim, J Mohan, DN Le, YC Jung, SJ Kim, JS Lee, J Ahn, ... AIP Advances 11 (11), 2021 | | 2021 |
| A comprehensive study on the effect of tin top and bottom electrodes on atomic layer deposited ferroelectric Hf˂ inf˃ 0.5˂/inf˃ Zr˂ inf˃ 0.5˂/inf˃ O˂ inf˃ 2˂/inf˃ thin films SJ Kim, J Mohan, HS Kim, SM Hwang, N Kim, YC Jung, A Sahota, K Kim, ... MATERIALS 13 (13), 2020 | | 2020 |
Si Joon KimAssociate Professor, Kangwon National UniversityVerified email at kangwon.ac.kr
