| Method of depositing nanolaminate film for non-volatile floating gate memory devices by atomic layer deposition CG Kim, LEE Young-Kuk, TM Chung, KS An, SS Lee, CHO Won-Tae US Patent 7,659,215, 2010 | 460 | 2010 |
| Impedance spectroscopy characterization of resistance switching NiO thin films prepared through atomic layer deposition YH You, BS So, JH Hwang, W Cho, SS Lee, TM Chung, CG Kim, KS An Applied physics letters 89 (22), 2006 | 161 | 2006 |
| Atomic layer deposition of nickel oxide films using Ni (dmamp) 2 and water TS Yang, W Cho, M Kim, KS An, TM Chung, CG Kim, Y Kim Journal of Vacuum Science & Technology A 23 (4), 1238-1243, 2005 | 115 | 2005 |
| Template condensation of formaldehyde with triamines. Synthesis and characterization of nickel (II) complexes with the novel hexaaza macrotricyclic ligands 1, 3, 6, 9, 11, 14 … MP Suh, W Shin, SG Kang, MS Lah, TM Chung Inorganic Chemistry 28 (8), 1602-1605, 1989 | 114 | 1989 |
| Atomic layer deposition of Ni thin films and application to area-selective deposition WH Kim, K Heo, YK Lee, TM Chung, CG Kim, S Hong, J Heo, H Kim Journal of the Electrochemical Society 158 (1), D1, 2010 | 106 | 2010 |
| Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films SH Kim, IH Baek, DH Kim, JJ Pyeon, TM Chung, SH Baek, JS Kim, ... Journal of Materials Chemistry C 5 (12), 3139-3145, 2017 | 98 | 2017 |
| Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O JH Han, YJ Chung, BK Park, SK Kim, HS Kim, CG Kim, TM Chung Chemistry of Materials 26 (21), 6088-6091, 2014 | 94 | 2014 |
| Synthesis of SnS thin films by atomic layer deposition at low temperatures IH Baek, JJ Pyeon, YG Song, TM Chung, HR Kim, SH Baek, JS Kim, ... Chemistry of Materials 29 (19), 8100-8110, 2017 | 75 | 2017 |
| Monodispersed ZnO nanoparticles from a single molecular precursor CG Kim, K Sung, TM Chung, DY Jung, Y Kim Chemical communications, 2068-2069, 2003 | 74 | 2003 |
| Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido … HY Kim, EA Jung, G Mun, RE Agbenyeke, BK Park, JS Park, SU Son, ... ACS Applied Materials & Interfaces 8 (40), 26924-26931, 2016 | 66 | 2016 |
| Plasma-enhanced atomic layer deposition of Ni SH Bang, WH Kim, GH Gu, YK Lee, TM Chung, CG Kim, CG Park, H Kim Japanese journal of applied physics 49 (5S2), 05FA11, 2010 | 65 | 2010 |
| Chemical Vapor Deposition of Ga2O3 Thin Films on Si Substrates DH Kim, SH Yoo, TM Chung, KS An, HS Yoo, YS Kim Bulletin of the Korean Chemical Society 23 (2), 225-228, 2002 | 60 | 2002 |
| High-performance thin-film transistors of quaternary indium–zinc–tin oxide films grown by atomic layer deposition IH Baek, JJ Pyeon, SH Han, GY Lee, BJ Choi, JH Han, TM Chung, ... ACS applied materials & interfaces 11 (16), 14892-14901, 2019 | 59 | 2019 |
| Atomic layer deposition of thin films using dimethylaluminum isopropoxide and water W Cho, K Sung, KS An, S Sook Lee, TM Chung, Y Kim Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (4 …, 2003 | 57 | 2003 |
| Phase-controlled SnO2 and SnO growth by atomic layer deposition using Bis (N-ethoxy-2, 2-dimethyl propanamido) tin precursor HY Kim, JH Nam, SM George, JS Park, BK Park, GH Kim, DJ Jeon, ... Ceramics International 45 (4), 5124-5132, 2019 | 48 | 2019 |
| NiO thin films by MOCVD of Ni (dmamb) 2 and their resistance switching phenomena KC Min, M Kim, YH You, SS Lee, YK Lee, TM Chung, CG Kim, JH Hwang, ... Surface and Coatings Technology 201 (22-23), 9252-9255, 2007 | 48 | 2007 |
| Atomic Layer Deposition of TiO2 Thin Films from Ti(OiPr)2(dmae)2 and H2O JP Lee, MH Park, TM Chung, YS Kim, MM Sung Bulletin of the Korean Chemical Society 25 (4), 475-479, 2004 | 47 | 2004 |
| Four‐Bits‐Per‐Cell Operation in an HfO2‐Based Resistive Switching Device GH Kim, H Ju, MK Yang, DK Lee, JW Choi, JH Jang, SG Lee, IS Cha, ... Small 13 (40), 1701781, 2017 | 46 | 2017 |
| Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu Y Jang, JB Kim, TE Hong, SJ Yeo, S Lee, EA Jung, BK Park, TM Chung, ... Journal of Alloys and Compounds 663, 651-658, 2016 | 45 | 2016 |
| Atomic layer deposition of ruthenium and ruthenium oxide thin films from a zero-valent (1, 5-hexadiene)(1-isopropyl-4-methylbenzene) ruthenium complex and O2 HJ Jung, JH Han, EA Jung, BK Park, JH Hwang, SU Son, CG Kim, ... Chemistry of Materials 26 (24), 7083-7090, 2014 | 45 | 2014 |
